Glow Discharge Optical Emission Spectrometer (GD-OES)

Ultra Fast Elemental Depth Profiling

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.

HORIBA Scientific Pulsed RF Glow Discharge Spectrometers are used in academia and industry alike, from the development of new materials with ano-scale coatings to photovoltaic device manufacturing, helping to understand the origin of corrosion on painted car bodies, the composition of precious metals, to hard disks, LED manufacturing, or to improve Li batteries, etc.

Cross collaboration with the advanced plasma coating research community has helped to drastically improve the instrumentation in the last 15 years, ISO standards have been published and the technique is now well established for material characterisation.

Key Features

  • RF-Only generator is Class E standard and optimized for stability and crater shape allowing for real surface analysis
  • Source can be pulsed with synchronized acquisition for optimum results on fragile samples. The use of an RF source allows analysis of conventional and non conventional layers and materials
  • Simultaneous optic provides full spectral coverage from 110 to 800nm, including deep UV access to analyze H, O, C, N and Cl
  • HORIBA Scientific original, ion-etched holographic gratings assure the highest light throughput for maximum light efficiency and sensitivity
  • Patented HDD detection provides speed and sensitivity in detection without compromise
  • NEW Differential interferometry profiling accessory for monitoring the actual depth profile simultaneously with the GD analysis

Find out more product information from our supplier

Download Brochure

Not Sure Which System  is Right For You?

We have over 40 years of experience in sales and technical support of scientific instrumentation . We can help you decide on the appropriate equipment for your needs.

Looking on behalf of your University?

We can work with you to help get the ideal instruments into your university by providing any information you require.


GD-OES: Multilayer elemental depth profile

Most materials today are multilayered (automotive bodies, LED, photovoltaic thin films, hard disks, electrodes for Li batteries, coated glasses, etc.) or they feature surface treatments and coatings in order to enhance performance, to improve mechanical properties or to strengthen corrosion resistance (nitrides, biocompatible surfaces, advanced oxides, etc.)
In this context, pulsed RF GD-OES is the ideal analytical technique for studying layered materials as well as their process control. It offers ultrafast elemental depth profile analysis of thin and thick layers, conducting or isolating, with high sensitivity to all elements.

Ultra Fast

With a typical erosion rate of µm/min (2-10 nm/s), pulsed RF GD-OES is ultra fast. Researchers and users are therefore encouraged to run multiple samples or do multiple measurements on any specimen. The immediate feedback allows them to check for material homogeneity, to optimize and control each stage of their evaporation, deposition or annealing processes and to quickly react to any observed variation. Even polymeric layers are sputtered ultra fast without damage, due to HORIBA’s patented “UFS” system.

Nanometric depth resolution

Pulsed RF GD-OES offers superb depth resolution, down to the nanometre scale or below, made possible by the unique characteristics of the advanced pulsed RF GD source and the patented High Dynamic Detection capability of the optical system.

Optimum spectral coverage

High Dynamic and Ultra-Fast Optical Detection allows simultaneous measurement of all elements of interest in the depth profiles from ppm levels to 100%. The proprietary HORIBA diffraction gratings allow optimum measurements of emission lines ranging from the VUV (120 nm for H and its isotope D, 130 nm for O, etc.), to the IR for Li (670 nm) and K (766 nm).

Qualitative and quantitative depth profiles of thin and thick films

Surface sensitive techniques (XPS or SIMS) are slow and fail to measure layers of more than 1 micrometre. For thicker layers, SEM EDX on cross sections can be used, but require tedious preparation and cannot measure light elements.
Pulsed RF GD-OES, on the other hand, rapidly sputters tens of micrometres of conductive and non-conductive materials, measures all elements and is therefore ideal both for thin and thick layers.
Within the pulsed RF GD source, erosion and emission are spatially separated. Erosion is material dependent and measured with DiP. Excitation takes place in the gas phase only and uniquely relates to the plasma conditions and emission lines intensities are directly proportional to the  concentrations in the plasma. Conversion from measured signals (intensities vs time) to quantitative results (concentrations vs depth) is therefore straightforward.

Product Sales Enquiry







Working with you to find solutions to your scientific needs